| 008 |
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940715s1994 b 000 0 eng d |
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|a94022847
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|a1560818131 : |c|135.00
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|aTMUE|beng|cTMUE|dTMUE
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14
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|aTK7867|bC46 1994
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04
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|a621.3815/2|220
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|a01|b|p|tDDC|d621.38152|eC517|cA0157251|y1994|r886.0
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1
|
|aKodasToivo
|
| 245 |
10
|
|aThe chemistry of Metal CVD / |cedited by Toivo Kodas and Mark Hampden-Smith
|
| 260 |
|
|aWeinheim ; |aNew York : |bVCH, |c1994
|
| 300 |
|
|axxiv, 530 p : |bill ; |c25 cm
|
| 504 |
|
|aIncludes bibliographical references (p. 490-498)
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| 650 |
0
|
|aElectronic circuit design
|
| 650 |
0
|
|aChemical vapor deposition
|
| 650 |
0
|
|aMetallic films
|
| 700 |
1
|
|aHampden-Smith Mark J
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